Fe/Si多层膜亚层厚度比对β-FeSi_2薄膜结构和表面形貌的影响  

Influence of Sublayer Thickness Ratio of the Fe/Si Multilayer Films on the Structure and Surface Morphology of β-FeSi_2 Thin Film

作　　者：鲁林峰[1] 沈鸿烈[1] 张娟[1] 江丰[1] 李斌斌[1] 沈洲[1] 刘恋慈[1] 

机构地区：[1]南京航空航天大学材料科学与技术学院,南京211106

出　　处：《人工晶体学报》2010年第4期883-887,共5页Journal of Synthetic Crystals

基　　金：国家高技术研究发展计划(863)资助项目(2006AA03Z219)

摘　　要：采用射频磁控溅射方法,在Si(111)和石英衬底上制备了Fe/Si亚层厚度比不同的多层膜。多层膜的总厚度为252nm,Fe/Si亚层厚度比分别为1nm/3.2nm、2nm/6.4nm和20nm/64nm。在850℃,Ar气气氛中退火2h后,Si衬底上的多层膜完全生成了β-FeSi2相。但石英衬底上同样Fe/Si亚层厚度比的多层膜除了生成β-FeSi2相,还生成了少量的ε-FeSi相。通过增加Si亚层的厚度至Fe/Si亚层厚度比为2nm/7.0nm,在石英衬底上也获得了单相的β-FeSi2薄膜,其光学带隙为0.87eV,表面均方根粗糙度为2.34nm。Fe/Si multilayer thin films with different sublayer thickness ratios （ RFe/Si） were prepared by radio frequency magnetron sputtering on Si（ 111） and quartz substrates. The films have the same total thickness of 252 nm while the RFe/Si is 1 nm/3. 2 nm,2 nm/6. 4 nm and 20 nm/64 nm,respectively. After annealing at 850 ℃ in Ar atmosphere for 2 h,all the multilayer films on Si （ 111） substrate completely formed β-FeSi2 film. For the same RFe/Si,β-FeSi2 phase and a small amount of ε-FeSi phase were formed on quartz substrates. By increasing the thickness of Si sublayer in the Fe/Si multilayer films to Fe （ 2 nm） / Si （ 7. 0 nm） ,a film with single phase of β-FeSi2 was obtained on the quartz substrate. The optical gap of the sample is 0. 87 eV and the surface root mean square roughness is 2. 34 nm.

关 键 词：β-FeSi2薄膜 石英衬底 亚层厚度比 多层膜 

分 类 号：TB303[一般工业技术—材料科学与工程] TB34