Enhanced Surface-Plasmon-Polariton Interference for Nanolithography by a Micro-Cylinder-Lens Array  

作　　者：梁慧敏 王景全 范锋 秦爱丽 张春元 成惠 

机构地区：[1]College of Science, Hebei University of Engineering, Handan 056038 [2]College of physical Science and Technology, Sichuan University, Chengdu 610064

出　　处：《Chinese Physics Letters》2010年第9期100-102,共3页中国物理快报（英文版）

摘　　要：A practical interference lithography scheme based on surface plasmon polaritions （SPPs） is suggested. In this scheme, a micro-cylinder-lens array is employed to generate the evanescent wave （EW） carrying much energy. When the top of the cylinder lenses are in close contact with a metal film coated on a resist, the energy of EW will launch strong SPPs and form enhanced interference nanopatterns in the resist. The simulation results confirm that a high quality nanopattern with a critical dimension of λ/7 can be achieved in the resistance. The anaJysis results indicate that the height of the cylinder lenses can provide a large tolerance to decrease the fabrication difficulty of this element.A practical interference lithography scheme based on surface plasmon polaritions （SPPs） is suggested. In this scheme, a micro-cylinder-lens array is employed to generate the evanescent wave （EW） carrying much energy. When the top of the cylinder lenses are in close contact with a metal film coated on a resist, the energy of EW will launch strong SPPs and form enhanced interference nanopatterns in the resist. The simulation results confirm that a high quality nanopattern with a critical dimension of λ/7 can be achieved in the resistance. The anaJysis results indicate that the height of the cylinder lenses can provide a large tolerance to decrease the fabrication difficulty of this element.

分 类 号：TN946[电子电信—信号与信息处理] TN248.1[电子电信—信息与通信工程]