紫外光刻法制备图案化聚合物纳米管/线阵列的研究  

Fabrication of patterned polymer nanostructure arrays by photolithographic approaches

作　　者：李培栋[1] 李晓茹[1] 宋国君[1] 彭智[1] 佘希林[1] 李建江[1] 孙瑾[1] 

机构地区：[1]青岛大学化学化工与环境学院,山东青岛266071

出　　处：《功能材料》2010年第8期1350-1352,共3页Journal of Functional Materials

基　　金：国家自然科学基金资助项目(50473012);山东省自然科学基金资助项目(Z2005F03)

摘　　要：探讨了紫外光刻技术制备图案化聚合物纳米管/线阵列的方法,研究制备过程中的各种影响因素,并找到了最佳的实验条件。采用溶液浸润法,成功制备了不同图案的聚合物纳米结构阵列。溶液浓度为6%(质量分数),得到的是聚合物纳米管阵列;溶液浓度为10.0%(质量分数),得到的是聚合物纳米线阵列。Large area polymer nanostructure arrays were successfully patterned by photolithographic approach using anodic aluminum oxide （AAO） templates. Different factors were discussed in the process of experiments. Finally,the best experiment conditions were confirmed. Polymer nanostructure arrays with different patterns were successfully fabricated by solution-wetting method. Nanotubes were obtained when the solution concentration is 6.0wt%,while nanowires were formed when the concentration equals to 10.0wt%.

关 键 词：紫外光刻技术 纳米管 纳米线 AAO模板 图案化 

分 类 号：TB383[一般工业技术—材料科学与工程]