TiAlN/CrAlN纳米结构多层膜的结构与性能  

Microstructure and properties of TiAlN /CrAlN nanostructured multilayer films

作　　者：董松涛[1] 喻利花[1] 薛安俊[1] 许俊华[1] 

机构地区：[1]江苏科技大学材料科学与工程学院 江苏省先进焊接技术重点实验室,江苏镇江212003

出　　处：《材料热处理学报》2010年第8期121-126,共6页Transactions of Materials and Heat Treatment

基　　金：国家自然科学基金(50574044);江苏省自然科学基金(BK2008240)

摘　　要：采用射频磁控溅射方法制备了单层TiAlN、CrAlN复合薄膜以及不同调制周期和不同层厚比(lTiAlN/lCrAlN)的TiAlN/CrAlN纳米结构多层膜。薄膜采用X射线衍射仪、扫描电子显微镜、显微硬度仪进行表征。结果表明:TiAlN、CrAlN复合薄膜和TiAlN/CrAlN多层膜均为面心立方结构,呈(111)面择优取向。TiAlN/CrAlN多层膜的择优取向与调制周期和层厚比无关。层厚比为1的TiAlN/CrAlN多层膜的硬度依赖于调制周期,在调制周期为8nm时,达到最大;固定TiAlN的厚度为4nm,改变CrAlN层的厚度,在研究范围内,多层膜的硬度随着CrAlN层厚度的增加而增加。探讨了多层膜的致硬机制。TiAlN/CrAlN多层膜抗氧化温度比其组成单层膜高了近200℃,并讨论了其抗氧化机制。Monolithic TiAlN,CrAlN films and TiAlN /CrAlN multilayer films with different modulation period and different layer thickness ratio（lTiAlN /lCrAlN ） were prepared by radio freguency（RF） magnetron sputtering.The films were characterized by X-ray diffraction（XRD）,scanning electron microscopy （SEM）,and microhardness test.Results show that the CrAlN,TiAlN films and TiAlN /CrAlN multilayer films are fcc structure with a （111） preferential orientation.The preferred orientation of TiAlN /CrAlN multilayer films is independent on modulation period and layer thickness ratio.The hardness of TiAlN /CrAlN multilayer film with layer thickness ratio of 1 depends on the modulation period.When the modulation period is 8 nm,the hardness of TiAlN /CrAlN multilayer film reaches to maximum value.In the range of present research,the hardness of TiAlN /CrAlN multilayer films increases with the increase of thickness of CrAlN layer when the thickness of TiAlN layer keeps at 4 nm.The hardening mechanism of TiAlN /CrAlN multilayer films are discussed.The oxidation temperature of TiAlN /CrAlN multilayer films is higher 200 ℃ than that of TiAlN and CrAlN films.The oxidation mechanism of the TiAlN /CrAlN multilayer films are also discussed.

关 键 词：TiAlN/CrAlN纳米多层膜 显微硬度 微结构 抗氧化性能 

分 类 号：TG174.44[金属学及工艺—金属表面处理] TG148[金属学及工艺—金属学]