梭式氮化窑用Si_3N_4-SiC匣钵砖用后分析  

Analysis on used Si_3N_4-SiC sagger bricks for nitridation shuttle kiln

作　　者：李勇[1] 王佳平[1] 朱晓燕[1] 薄钧[2] 张建芳[2] 

机构地区：[1]北京科技大学材料科学与工程学院,北京100083 [2]中钢集团耐火材料有限公司,河南洛阳471039

出　　处：《耐火材料》2010年第4期256-259,共4页Refractories

摘　　要：利用XRD、SEM和EDAX对在梭式氮化窑中使用1年后的反应烧结Si3N4-SiC匣钵砖内外侧进行了分析。结果表明:在匣钵外侧(氧化气氛),匣钵砖表面12 mm厚的区域呈完全氧化状态,主要氧化产物是SiO2;紧随其后的12～20 mm区域呈部分氧化状态,氧化产物主要为Si2N2O及少量SiO2;20 mm以后区域无明显氧化特征。在匣钵内侧(氮气气氛),匣钵砖表面出现了约0.2 mm厚的氧化层,主要氧化产物是SiO2,该SiO2可能是由气态SiO氧化形成的,而气态SiO主要来自SiC的氧化及氮化过程中形成的气态SiO;从显微结构可以看出,SiC颗粒表面氧化明显。Behavior of Si3N4-SiC sagger brick after being used for about one year in nitridation shuttle kiln was researched by means of XRD,SEM and EDAX.The result indicates that in outer side of sagger（oxidative atmosphere）,the oxidized surface region about 0-12 mm thickness of sagger brick is in a completely oxidation status,and the main oxidation product is SiO2;12-20 mm region is partially oxidized,and the oxidation products are mainly Si2N2O and a little SiO2;the region exceeding 20 mm thickness is of no significant oxidation characteristics;in inner side of sagger（nitrogen atmosphere）,about 0.2 mm thickness oxidation layer appears in the sagger brick surface,and SiO2 is the main oxidation product;the SiO2 may be formed by the oxidation of SiO gaseous;the SiO gaseous mainly comes from the oxidation of SiC and the nitriding process.From microcosmic structure it can be seen that surface of SiC particle is obviously oxidized.

关 键 词：氮化 梭式窑 匣钵砖 反应烧结 SI3N4-SIC材料 

分 类 号：TQ124.758[化学工程—无机化工]