光栅干涉位移测量技术发展综述  

Development of displacement measurement technologies based on grating interferometry

作　　者：王国超[1] 颜树华[1] 高雷[1] 谢学东[1] 田震[1] 

机构地区：[1]国防科学技术大学机电工程与自动化学院,长沙410073

出　　处：《激光技术》2010年第5期661-664,716,共5页Laser Technology

基　　金：国家自然科学基金资助项目(50875258)

摘　　要：介绍了经典双光栅测量系统、非对称双级闪耀光栅测量系统、单光栅测量系统、基于2次莫尔条纹的光栅测量系统、同心圆光栅2维位移测量系统、2维光栅位移测量系统的测量原理,阐述了各系统的关键问题及不足之处。同时结合双频激光干涉仪外差干涉思想,在单光栅测量系统的基础上,提出了双波长单光栅式纳米级位移测量方法,并通过分析系统特点指出该方法能实现大量程测量、获得纳米级的精度和分辨力。在对各种测量方法进行综合比较之后,总结了光栅测量的关键问题,并展望了光栅干涉位移测量的未来发展方向。Methods of displacement measurement based on grating interferometry, including classical measurement systems, nonsymmetrical doubly blazed reference grating measurement systems, single grating dual-grating systems, grating measurement systems based on the 2nd harmonic Moir6 fringes, concentric-circle grating two-dimension displacement measurement systems, and the two-dimension grating measurement systems, were introduced. The key problems and disadvantages of each system were presented as well. According to dual-frequency laser interferometer, the dual-wavelength single grating nanometer displacement measurement was put forth based on the single grating measurement system. After analyzing its characteristics, it was pointed out that it could realize the measurement with a wide range, nanometer precision and nanometer resolution. After a general comparison among these methods, a conclusion of key technologies was drawn, and an outlook of displacement measurement based on grating interferometry was presented.

关 键 词：测量与计量 位移 光栅 干涉条纹 

分 类 号：TH741[机械工程—光学工程]