多铁性BiFeO_3/SrTiO_3多层膜的透射电镜研究  

Transmission electron microscopic study of BiFeO_3 /SrTiO_3 multiferroic multilayers

作　　者：唐兆俊[1] 王君伟[2] 朱银莲[1] 唐为华[2] 马秀良[1] 

机构地区：[1]中国科学院金属研究所沈阳材料科学国家(联合)实验室,辽宁沈阳110016 [2]浙江理工大学光电材料与器件中心,浙江杭州310018

出　　处：《电子显微学报》2010年第4期338-343,共6页Journal of Chinese Electron Microscopy Society

基　　金：国家自然科学基金面上资助项目(No.50871115及No.50672088);科技部973资助项目(No.2009CB623705)

摘　　要：本文利用透射电子显微镜(TEM)研究了由磁控溅射法生长的多铁性BiFeO3/SrTiO3多层膜的微观结构。衍衬分析及高分辨电子显微(HRTEM)像显示出界面清晰的各个单层。BiFeO3外延生长在SrTiO3(001)衬底上,生长方向沿基体c轴。随着薄膜厚度的增加,即多层膜周期的加长,层与层之间界面不再平直。原子序数Z衬度成像,EDS线扫以及各种元素的能量过滤综合分析确定了多层膜的成分变化特征。Microstructures of BiFeO3 /SrTiO3 Multiferroic multilayers prepared by magnetron sputtering were studied by transmission electron microscopy（TEM）.Electron diffraction and contrast analysis reveal a very clear and well separated layer sequence.The BiFeO3 /SrTiO3 multilayer is epitaxially grown on the substrate.The interface between the thin film and the substrate is sharp and distinct.High-angle angular dark-field imaging,elemental mapping and compositional analysis revealed that the compositions vary with the layer periodicity as expected.Due to the local composition inhomogeneity resulted from the sputtering process,it is found that interfaces become rough when increasing the thickness of the films.

关 键 词：多铁性 多层膜 界面 透射电子显微术 

分 类 号：TG115.215.3[金属学及工艺—物理冶金] TB383[金属学及工艺—金属学]