脉冲电镀无裂纹硬铬研究  

A Study on Pulse Plating Crack-free Hard Chromium Coating

作　　者：王长亮[1] 汤智慧[1] 彭超[1] 张晓云[1] 陆峰[1] 

机构地区：[1]北京航空材料研究院,北京100095

出　　处：《电镀与精饰》2010年第9期31-34,共4页Plating & Finishing

摘　　要：在A-100高强钢基体上脉冲电镀硬铬,对各种工艺参数制备的铬层的微观形貌、镀层厚度及显微硬度进行了测试和分析。结果表明,各参数制备的铬层显微硬度均大于700HV,制备出无裂纹铬层的工艺参数为Jκ=50A/dm2、θ=75s、γ=0.8,最优参数下制备的铬层υ约为10μm/h,一个脉冲周期沉积无裂纹铬层的δ范围为0.23～0.27μm。Hard chromium coating pulse electroplating was conducted on A-100 high strength steel substrate. Morphology,thickness and microhardness of the chromium coatings prepared under various technological parameters were investigated. The experimental results indicated that microhardness of all chromium coatings prepared under various parameters were above 700HV. Optimal technological parameters for obtaining crack-free chromium coating were established at current density 50A/dm^2,pulse period 75s and duty cycle 0. 8. Deposition rate of the crack-free hard chromium coating under the optimal technological parameters was about 10μm/h.

关 键 词：脉冲镀铬 裂纹 厚度 

分 类 号：TQ153.11[化学工程—电化学工业]