脉冲激光沉积制备外延Ni_(0.8)Zn_(0.2)Fe_2O_4薄膜的应变与磁性能研究  

Strains and Magnetic Properties of Ni_(0.8)Zn_(0.2)Fe_2O_4 Films Grown by Pulsed Laser Deposition

作　　者：李扬权[1] 朱俊[1] 罗文博[1] 

机构地区：[1]电子科技大学电子薄膜与集成器件国家重点实验室,成都610054

出　　处：《真空科学与技术学报》2010年第5期500-504,共5页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金资助项目(50772019)

摘　　要：用脉冲激光沉积设备,分别在SrTiO3(001)(STO)和MgO(001)基片上外延生长了单层Ni0.8Zn0.2Fe2O4(NZF)薄膜。经X射线衍射分析,在STO和MgO基片上制备的NZF薄膜均为单一c取向的外延薄膜,由PHI扫描可知薄膜均为四重对称结构。由NZF薄膜的倒易空间图可以计算得到在STO和MgO基片上应变分别为0.0704和-0.0124。分别对不同基片上的NZF薄膜进行磁强计测量可得,在STO基片上沉积的NZF薄膜的面内和面外饱和磁化强度分别为269.6和224.78 emu/cm3,面内和面外的矫顽场分别为2.68×104和4.78×104A/m,在MgO基片上沉积的NZF薄膜的面内和面外饱和磁化强度分别为219.11和180.75 emu/cm3,面内和面外的矫顽场分别为3.46×104和5.32×104A/m。The Ni0.8Zn0.2Fe2O4（NZF） films were epitaxially grown by pulsed laser deposition （PLD） on substrates of SrTiO3（001） （STO） and MgO（001）. The microstructures and magnetic properties of the films were characterized with X-ray diffraction and scanning electron microscopy. The strains of the NZF films on STO and MgO substrates were calculated by means of the reciprocal space maps to be 0.0704 and -0.0124, respectively. The impacts of the deposition conditions on the epitaxial growth were also studied. The results show that the c-oriented epitaxial NZF films have a four-fold symmetry. The in-plane and out-of-plane saturation magnetizations of the NZF on STO were 269.6 emu/cm3 and 224.78 emu/cm3 ; and their coercive fields were 2.68 × 10 4 and 4.78 × 10 4 A/m, respectively. The in-plane and out-of-plane saturation magnetizations of the NZF on MgO were 219.11 emu/cm3 and 180.75 emufcm3; and their coercive fields were 3.46 × 10 4 and 5.32 × 10 4 A/m, respectively.

关 键 词：NZF薄膜 脉冲激光沉积 应变 饱和磁化强度 矫顽场 

分 类 号：O484.1[理学—固体物理] O484.2[理学—物理]