一种新颖的制备聚合物光电薄膜的旋涂装置  

New Kind of Spin-Coating Equipment for Polymer Thin Films

作　　者：文尚胜[1] 王保争[1] 张剑平[1] 桂宇畅[1] 赵宝锋 

机构地区：[1]华南理工大学高分子光电材料与器件研究所,广州510640

出　　处：《半导体技术》2010年第9期903-905,共3页Semiconductor Technology

基　　金：广东省科技计划项目(2005B50101005;2007A010500011)

摘　　要：设计了一种新颖的制备聚合物光电薄膜的旋涂装置。该设计在传统旋涂装置的基础了,通过增加聚合物溶液载台转盘法向进动功能,改进了聚合物溶液成膜质地疏松、致密度不高问题,减少了成膜过程中产业气泡等缺陷的几率。通过增加聚合物溶液载台转盘径向变轴功能,改善了聚合物薄膜径向厚度的均匀性,从而可以借助于旋涂法制备更大尺寸的薄膜器件。理论和试验结果表明,该项改进设计对提高聚合物光电薄膜的制备质量有一定的实用价值。A new kind of spin-coating equipment for polymer thin films was designed based on the design of traditional spin-coating device. By adding the upward processing function on normal direction of the polymer solution platform turntable, the problems about loose texture and low density were solved, and the probability of defects forming such as bubbles in the process of film formation was reduced. By adding the axis varying function on radial direction of polymer solution platform turntable, the performance of thickness uniformity on radial direction of polymer thin films was improved. Then large-size thin film devices can be prepared by means of the new spin-coating. Theoretical and experimental results show that the improved design has a certain practical value on improving the preparation quality of polymer thin films.

关 键 词：聚合物 旋涂 均匀性 薄膜 

分 类 号：TN305[电子电信—物理电子学] O611[理学—无机化学]