Effect of template shape on metal nanoimprinting:a dislocation dynamics study  

作　　者：Lucia NICOLA 

机构地区：[1]Department of Materials Science and Engineering,Delft University of Technology

出　　处：《Journal of Zhejiang University-Science A(Applied Physics & Engineering)》2010年第10期722-726,共5页浙江大学学报（英文版）A辑（应用物理与工程）

基　　金：Project (No VENI 08120) supported by the Dutch National Scientific Foundation NWO and Dutch Technology Foundation STW

摘　　要：Dislocation dynamics simulations are performed to investigate the effect of template shape on the nanoimprinting of metal layers. To this end, metal thin films are imprinted by a rigid template made of an array of equispaced indenters of various shapes, i.e., rectangular, wedge, and circular. The geometry of the indenters is chosen such that the contact area is approximately the same at the final imprinting depth. Results show that, for all template shapes, the final patterns strongly depend on the dislocation activity, and that each imprint differs from the neighboring ones. Large material pile ups appear between the imprints, such that polishing of the metal layer is suggested for application of the patterns in electronics. Rectangular indenters require the lowest imprinting force and achieve the deepest retained imprints.Dislocation dynamics simulations are performed to investigate the effect of template shape on the nanoimprinting of metal layers. To this end, metal thin films are imprinted by a rigid template made of an array of equispaced indenters of various shapes, i.e., rectangular, wedge, and circular. The geometry of the indenters is chosen such that the contact area is approximately the same at the final imprinting depth. Results show that, for all template shapes, the final patterns strongly depend on the dislocation activity, and that each imprint differs from the neighboring ones. Large material pile ups appear between the imprints, such that polishing of the metal layer is suggested for application of the patterns in electronics. Rectangular indenters require the lowest imprinting force and achieve the deepest retained imprints.

关 键 词：NANOIMPRINTING Dislocation dynamics Simulations 

分 类 号：TB383.1[一般工业技术—材料科学与工程]