X射线螺旋波带片制备技术  

Fabrication techniques of X-ray spiral zone plates

作　　者：高南[1] 朱效立[1] 李海亮[1] 谢常青[1] 

机构地区：[1]中国科学院微电子研究所,北京100029

出　　处：《核技术》2010年第10期730-733,共4页Nuclear Techniques

基　　金：国家重点基础研究发展计划(973)项目(2007CB935302)资助

摘　　要：本文将电子束曝光和X射线曝光技术相结合以制造X射线波段螺旋波带片。用电子束曝光和微电镀技术在镂空薄膜上制备母波带片X射线掩模版,用X射线曝光和微电镀技术小批量复制螺旋波带片。研制成可用于1.24nm波长的螺旋波带片,其最外环宽度为200nm,金吸收体厚度为700nm,占空比合理,侧壁陡直,结构优良。The techniques to make X-ray spiral zone plates using electron beam and X-ray lithography were studied. A master mask was fabricated on polyimide membrane by E-beam lithography and micro-electroplating. Spiral zone plates were efficiently replicated by X-ray lithography and micro-electroplating. By combining the techniques,spiral zone plates at 1 keV were successfully fabricate. With an outermost zone width of the 200 nm,and the gold absorbers thickness of 700 nm,the high quality zone plates can be used for X-ray phase contrast microscopy.

关 键 词：螺旋波带片 电子束光刻 X射线光刻 X射线成像 

分 类 号：TN205[电子电信—物理电子学]