熔石英亚表面微缺陷原位表征及损伤阈值研究  

In-situ characterization of subsurface microdefects and damage threshold of the fused silica

作　　者：蒋勇[1,2] 袁晓东[1] 向霞[1,2] 徐世珍[2] 陈猛[1,2] 王海军[1] 郑万国[1] 贺少勃[1] 蒋晓东[1] 吕海兵[1] 陈清海[1] 祖小涛[2] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,四川绵阳621900 [2]电子科技大学物理电子学院,四川成都610054

出　　处：《光电子．激光》2010年第10期1519-1523,共5页Journal of Optoelectronics·Laser

基　　金：国家"863"计划资助项目(2008AA8040508);电子科技大学青年基金重点资助项目(L08010401JX0806)

摘　　要：通过对熔石英表面和亚表面划痕的原位测量,研究划痕的表面均方根(RMS)粗糙度、宽度和深度在HF溶液中刻蚀不同时间后的变化规律,测试了不同刻蚀时间下熔石英的损伤阈值。实验结果表明:随刻蚀时间的增加,表面RMS、划痕深度及宽度的总体变化趋势是增加的;熔石英的损伤阈值随刻蚀时间的增加,在1～10min时间段呈增加趋势,在20～40 min时间段呈下降趋势,而在60～120 min时间段先增加后降低。综合熔石英划痕的微观形貌损伤阈值的测量结果认为,刻蚀10 min时效果最佳。Through in-situ measurements of surface and subsurface scratches in fused silica,the relationships between HF acid etching time and surface root mean square（RMS） roughness,as well as width and depth of scratches are investigated.The damage thresholds are also tested on fused silica after etching for different time.The results show that the surface RMS roughness,width and depth increase with the etching time.The damage threshold is increased when the etching time is from 1 min to 10 min,while it is decreased after etching for 20 min to 40 min.The damage threshold first increases,and then decreases between 60 min and 120 min.Through in-situ measurement and damage threshold test on fused silica,it is shown that 10 min is the optimal etching time.

关 键 词：熔石英 划痕 原位测量 表面粗糙度(RMS) 损伤阈值 

分 类 号：O483[理学—固体物理]