铝衰减膜表面氧化对软X光透过率的影响与修正  

Surface Oxidation of Aluminum Attenuation Foil: Influence and Modification to the Transmittance of Soft X ray

作　　者：赖珍荃[1,2] 沈军[1,2] 杜保旗[1,2] 王珏 陈玲燕[1,2] 

机构地区：[1]同济大学波耳固体物理研究所 [2]南昌大学物理系

出　　处：《中国激光》1999年第6期493-496,共4页Chinese Journal of Lasers

基　　金：国家863强激光技术领域专题资助项目

摘　　要：对用不同方法制备的软Ｘ光激光实验用的Ａｌ衰减膜样品，用Ａｕｇｅｒ电子能谱（ＡＥＳ）结合氩离子束刻蚀进行了组分的表面和深度分布分析，结果表明表面氧化层主要由Ａｌ２Ｏ３组成，氧化达到饱和时的氧化层厚度≈７．５ｎｍ。由于在软Ｘ光波段内，氧的吸收系数比铝大一个多数量级，这一氧化层对软Ｘ光透过率的影响甚大。将ＡＥＳ测试结果作为参数，使用公式Ｉ＝Ｉ０·ｅｘｐ［－μ（Ｅ）·（ρｄ）］对Ｘ光透过强度进行修正。同步辐射软Ｘ光对样品透过率的直接测量表明，对于透过率大于２０％的Ａｌ膜，直接测量结果与按修正公式计算的结果在最大偏差１１％范围内符合。Aluminum foils were fabricated by two different methods evaporation and extrusion moulding. Depth distribution of surface elements and chemical components were analyzed by Auger Electron Spectroscopy (AES). Also the thickness of the oxidation layer exposed in ambient with different times was measured. According to the experimental results, the oxidation layer with saturated oxidation is mainly composed of Al 2O 3 and its thickness is about 7.5 nm. The throretical transmittance of the foil is then modifed by the formula I=I 0· exp [-μ(E)·(ρd)]. For comparison, experimental measurements of the transmittance are done on the Beijing synchrotron radiation facility, which are consistent with the throretical value within a maximum difference of 11%.

关 键 词：铝衰减膜 表面氧化 透过率 X光激光 软X光 

分 类 号：TN24[电子电信—物理电子学]