HfO_2单层膜的吸收和激光损伤阈值测试  

Absorption and laser-induced damage threshold of single-layer HfO_2 film

作　　者：李淑红[1,2] 贺洪波[1] 刘晓凤[1,2] 单永光[1,2] 周明[1,2] 李大伟[1] 赵元安[1] 范正修[1] 

机构地区：[1]中国科学院上海光学精密机械研究所,上海201800 [2]中国科学院研究生院,北京100039

出　　处：《强激光与粒子束》2010年第11期2596-2598,共3页High Power Laser and Particle Beams

摘　　要：薄膜吸收是降低膜层激光损伤阈值的重要原因,为了研究薄膜吸收对激光损伤阈值的影响,对HfO2单层膜在1 064 nm处的吸收及其在不同波长激光辐照下的损伤阈值进行了测试和分析。研究结果表明:薄膜的激光损伤阈值由薄膜吸收平均值(决定于薄膜中缺陷的种类和数量)和吸收均匀性(决定于薄膜中缺陷的分布)共同决定;根据HfO2单层膜在1064 nm波长处的吸收值,不但可以定性判断薄膜在1 064 nm波长,而且还可以判断在其它波长激光辐照下的抗激光损伤能力。The absorption of thin films is an important factor that reduces their laser induced damage threshold.The absorption at 1 064 nm and the laser-induced damage threshold at different wavelengths（1 064,532,355 nm） of single-layer HfO2 films were measured and analyzed.The results show that laser induced damage threshold is determined by the average value and uniformity of the film＇s absorption,which depend on the type and quantity,and the distribution of defects in the film,respectively.The laser damage resistance of the single-layer HfO2 film irradiated at the three wavelengths（1 064,532,355 nm） can be deduced qualitatively by the measured absorption at 1 064 nm.

关 键 词：薄膜 弱吸收 激光损伤阈值 均匀性 

分 类 号：O484.4[理学—固体物理]