表面覆盖钛薄膜的纳米片状碳膜场发射特性(英文)  

Enhanced Field Emission Characteristic of Nano-sheet Carbon Films Coated with a Thin Ti Film

作　　者：胡新宇[1] 李英爱[2] 许基松[1] 顾广瑞[1] 

机构地区：[1]延边大学理学院物理系,吉林延吉133002 [2]吉林大学超硬材料国家重点实验室,吉林长春130012

出　　处：《延边大学学报（自然科学版）》2010年第3期228-231,共4页Journal of Yanbian University（Natural Science Edition）

基　　金：教育部留学归国人员科研启动基金资助项目(教外司留[2009]1341号)

摘　　要：利用石英管型波等离子体化学气相沉积装置在Si衬底上沉积了纳米片状碳膜,然后采用电子束蒸镀方法在碳膜表面沉积了一层2 nm厚的Ti膜,并在高真空系统中测量了覆盖Ti膜前后的纳米片状碳膜的场发射特性.研究表明:覆盖Ti膜的纳米片状碳膜因表面生成碳化钛而改性,使得场发射特性得到改善;表面覆盖Ti膜后,阈值电场由2.6 V/μm下降到2.0 V/μm,当电场增加到9 V/μm时,场发射电流由12.4 mA/cm2增加到20.2 mA/cm2.Nano-sheet carbon films（NSCFs） were fabricated on Si wafer chips by means of quartz-tube-type microwave plasma chemical vapour deposition（MWPCVD）.In order to further improve the field emission（FE） current density,a 2-nm Ti film was prepared on the samples by using electron beam（EB） evaporation.The FE characteristics of the Ti-coated NSCF were measured in an ultrahigh vacuum system.The FE properties of the NSCF are obviously improved due to its surface modified by titanium carbide after deposition of a thin layer of Ti film.The threshold field is decreased from 2.6 V/μm to 2.0 V/μm and the FE current density at a macroscopic electric field of 9 V/μm is increased from 12.4 mA/cm^2 to 20.2 mA/cm^2 for Ti-coated nano-sheet carbon films.

关 键 词：纳米片状碳膜 场发射 Ti膜 微波等离子体CVD 

分 类 号：O462.4[理学—电子物理学]