壳聚糖希夫碱钴配合物的合成及抗羟基自由基活性  

Synthesis of chitosan Schiff-bases cobalt complexes and its activity of removing

作　　者：李全芳[1] 何玉凤[1] 王荣民[1] 谢云涛[1] 王向原[1] 

机构地区：[1]生态环境相关高分子材料教育部重点实验室,甘肃省高分子材料重点实验室,西北师范大学化学化工学院,甘肃兰州730070

出　　处：《化学研究与应用》2010年第10期1295-1299,共5页Chemical Research and Application

基　　金：国家自然科学基金资助项目(20274034);教育部科学技术研究重点资助项目(207120)

摘　　要：以水溶性低聚壳聚糖为原料,经水杨醛、香草醛、2,4-二羟基苯甲醛修饰后制得了三种低聚壳聚糖希夫碱钴配合物CS-Sal-Co、CS-Val-Co和CS-Dh-Co,采用FT-IR和ICP对其结构和金属含量进行了分析。首次采用BPR-硫脲催化光度法测定了三种钴配合物的抗.OH活性。结果表明:CS-Sal-Co对.OH的清除效果最好,清除率可达到95.41%;CS-Val-Co对.OH的清除作用较弱,清除率最大为46.77%;CS-Dh-Co对.OH清除率最大为58.50%。探讨了壳聚糖希夫碱钴配合物清除.OH的机理。Using water-soluble low molecular weight chitosan（CS） as materials,after being modified by salicylaldehyde,vanillin,and 2,4-dihydroxy benzaldehyde,three kinds of water-soluble low molecular weight chitosan Schiff-bases cobalt complexes were synthesized.They were characterized by FT-IR and ICP.The activity for removing hydroxyl radical of three low molecular weight chitosan Schiff-bases cobalt complexes was determined by BPR-thiourea catalytic spectrophotometry.The results showed that the hydroxyl radical clearance of chitosan salicylaldehyde Schiff-bases cobalt complex（CS-Sal-Co） was highest,which reached 95.41%.The hydroxyl radical clearance of chitosan 2,4-dihydroxy benzaldehyde Schiff-bases cobalt complex（CS-Dh-Co） reached 58.50%.The hydroxyl radical clearance of chitosan vanillin Schiff-bases cobalt complex（CS-Val-Co） was the lowest,which reached 46.77%.The mechanism of hydroxyl radical clearance of three chitosan Schiff-bases cobalt complexes had been discussed.

关 键 词：壳聚糖希夫碱 水溶性钴配合物 抗羟基自由基活性 

分 类 号：O636.1[理学—高分子化学]