聚酰亚胺纳米线阵列的制备及浸润机理研究  

Fabrication of polyimide nanowires array and research on the wetting mechanism

作　　者：许云[1] 李林斌[1] 辜萍[1] 

机构地区：[1]中国科学技术大学近代力学系,中国科学院材料力学行为与设计重点实验室,安徽合肥230027

出　　处：《中国科学技术大学学报》2010年第10期999-1003,共5页JUSTC

基　　金：国家自然科学基金(10302026)资助

摘　　要：采用聚合物溶液浸润模板的物理方法,以聚酰胺酸溶液为前驱体,氧化铝膜为模板,制备了聚酰亚胺纳米线阵列,并用扫描电镜对纳米线阵列形貌进行表征.通过测量纳米线阵列的高度来表征聚合物溶液在纳米管中的流动距离,结果表明聚合物溶液在纳米尺度上的流动行为符合Lucas-Washburn方程.并探讨了聚合物溶液浓度对浸润机理及纳米结构形成的影响,有助于更好地控制模板中形成的纳米阵列结构.Polyimide nanowire array was fabricated by wetting alumina templates using polyamic acid solution.SEM was employed to characterize the morphology of nanowires.The flow distance of polymer solution in nanochannels was investigated by measuring the length of generated polymer nanowires,which demonstrates that the flow behaviour of polymer solution on nanoscale is in accordance with LucasWashburn equation.The influence of polymer solution concentration on the wetting mechanism and formed structures was discussed to help better control the nanostructure in the template.

关 键 词：模板浸润法 聚酰亚胺 纳米线阵列 浸润机理 

分 类 号：TB324[一般工业技术—材料科学与工程]