磁控阴极溅射靶三维磁场的有限元分析  

Analysis of 3D magnetic field in mag netic control cathode splash target by finite element method

作　　者：田立坚[1] 唐燕[1] 郝淑荣[2] 李岩[1] 

机构地区：[1]沈阳工业大学,辽宁沈阳110023 [2]辽宁省水利水电勘测设计院,辽宁沈阳110006

出　　处：《沈阳工业大学学报》1999年第2期136-139,共4页Journal of Shenyang University of Technology

摘　　要：采用有限元方法对磁控阴极溅射靶三维磁场进行了计算和分析．该装置是一种用于玻璃镀膜的永磁装置，主要由永磁体、铁磁材料和不锈钢板组成．为保证靶中不锈钢板表面的磁场均匀分布，进行了多种方案的计算和调整，给出了一种实用方案，使得装置性能得到明显改善．In this paper, the finite element method was used to calculate the 3D magnetic field of magnetic control cathode splash target (MCCST). Different schemes were computed and adjusted in order to improve the magnetic flux distribution on the surface of stainless steel plate in MCCST. In the final, a fairly good structure in which the magnetic distribution met the preset requirement was chosen.

关 键 词：有限元 电磁场 永磁装置 磁控阴极溅射靶 镀膜 

分 类 号：TM153.1[电气工程—电工理论与新技术] O484.1[理学—固体物理]