化学溶液沉积制备钼酸锶多晶薄膜中工艺参数影响的研究  

Effects of processing parameters on the structure and morphology of crystallized SrMoO_4 films prepared by chemical solution deposition

作　　者：刘洋[1] 余萍[1] 肖定全[1] 田云飞[1] 刘旭[1] 李园利[1] 

机构地区：[1]四川大学材料科学与工程学院材料科学系,四川成都610064

出　　处：《功能材料》2010年第11期1932-1935,共4页Journal of Functional Materials

基　　金：国家自然科学基金重大国际合作资助项目(50410179);国家自然科学基金自由申请资助项目(50277204;50772068);霍英东教育基金资助项目(94008)

摘　　要：采用化学溶液沉积技术,在单晶硅衬底上制备了钼酸锶多晶薄膜;利用XRD和SEM分析了薄膜的晶相和形貌;系统研究了化学溶液沉积制备钼酸锶多晶薄膜中的工艺参数,包括化学溶液的组成(醇、酸的含量)、溶液浓度、热处理工艺以及采用不同的锶盐等,对钼酸锶薄膜生长的影响。研究结果表明,采用化学溶液沉积技术制备的钼酸锶多晶薄膜均具有单一的四方相结构;除溶液中的醇含量之外,所讨论的工艺参数对薄膜的相结构、形貌、显露晶面等均会带来一定的影响;优化工艺参数、控制工艺规范对于获得结构致密、晶粒发育良好的钼酸锶薄膜是非常重要的。Under different processing conditions,crystallized SrMoO4films with single scheelite-structure have been prepared on Si substrates via chemical solution deposition.The films were characterized by X-ray diffraction（XRD）and scan electric micrograph（SEM）techniques.The effects of the processing parameters（including the contents of alcohol and acetic acid,solution concentration,and so on）on the structure and morphologies of the films have been systematically discussed.The research results indicated that all the prepared SrMoO4 films possess tetragonal phase with scheelite-structure and the growing characteristic of the films relied on the processing conditions except for the content of the alcohol.And also optimizing the processing conditions is very important for obtaining the dense and well-growth SrMoO4 thin films.

关 键 词：化学溶液沉积技术 钼酸锶 薄膜 工艺参数 晶相 

分 类 号：O484.1[理学—固体物理] TB34[理学—物理]