基于ELID磨削WC-Co硬质合金表面机械研抛研究  

The mechanical polishing research on the surface of WC-Co cemented carbide based on electrolytic in-process ( ELID) grinding

作　　者：关佳亮[1] 吴衍才[1] 肖小华[1] 王巧云[1] 陆宏伟[1] 

机构地区：[1]北京工业大学机电学院,北京100124

出　　处：《金刚石与磨料磨具工程》2010年第5期11-14,20,共5页Diamond & Abrasives Engineering

基　　金：国家自然科技基金委员会-中国工程物理研究院联合基金资助项目(10676001)

摘　　要：本文采用ELID磨削和机械研磨抛光复合技术,对WC-Co硬质合金表面进行了超精密加工实验研究。首先采用ELID磨削对WC-Co硬质合金表面进行预加工,获得表面粗糙度Ra18 nm的精密加工表面。在此基础上对其进行机械研磨抛光加工,研抛盘转速设定为150～200 r/min,研抛压力控制在0.2～0.5 N/cm2范围;机械研抛时,首先采用含W1金刚石磨粒的研抛液,对ELID磨削后的表面进行加工100min左右,以达到快速去除的目的。再用含W0.5金刚石磨粒的研抛液,进行机械研抛约100 min,最后获得Ra4 nm的超精密表面。同时,针对机械研磨抛光过程,本文深入研究了磨料种类、粒度、抛光液溶剂、研抛压力、研抛加工时间等因素对加工表面粗糙度的影响。In this paper,a composite technique of ELID grinding and mechanical polishing is used for ultraprecision machining experimental research.First,ELID grinding is adopted to pre-process the surface of WC-Co cemented carbide,obtaining the precision machined surface Ra18 nm,then the mechanical polishing process is implemented.When conducting mechanical polishing,the speed of the turntable is set to 150～200 r/min,and the polishing pressure is controlled in 0.2～0.5 N/cm2,the polishing liquid containing W1 diamond grits is used to process the surface for about 100 minutes,aiming to achieve a rapid removal.Then using the polishing liquid containing W0.5 diamond grits for another 100 minutes,an ultra-precision surface Ra 4 nm is obtained by the mechanical polishing method.Meanwhile,the influence factors of the surface roughness during mechanical polishing process were tested,such as abrasive type,grain size,polishing liquid solvents,polishing pressure,polishing time,etc.

关 键 词：WC-CO硬质合金 超精密加工 ELID磨削 机械研磨抛光 

分 类 号：TG58[金属学及工艺—金属切削加工及机床]