Na掺杂量对ZnO薄膜AFM图像多重分形谱的影响  

The influence of Na-doped content on the AFM images of ZnO thin films

作　　者：吕建国[1,2] 陈学梅[1] 朱剑博[1] 黄凯[3] 宋学萍[2] 孙兆奇[2] 

机构地区：[1]合肥师范学院物理与电子工程系,安徽合肥230601 [2]安徽大学物理与材料科学学院,安徽合肥230039 [3]安徽建筑工业学院数理系,安徽合肥230601

出　　处：《电子显微学报》2010年第5期415-419,共5页Journal of Chinese Electron Microscopy Society

摘　　要：用溶胶-凝胶法在Si(111)基片上制备Na掺杂ZnO薄膜,利用原子力显微镜(AFM)观察薄膜的表面形貌,采用多重分形理论定量表征薄膜的AFM图像。结果显示:随着Na含量的增加,薄膜平均颗粒尺寸逐渐增大,表面RMS粗糙度从7.4 nm增大到44.4 nm,分形谱宽Δα从0.059增大到0.200,说明薄膜表面高度分布不均匀程度逐渐增大;所有样品的Δf值均大于零,表明薄膜表面沉积于最高峰的原子数多于最低谷的原子数。Na-doped ZnO thin films were deposited on Si（111） substrate by sol-gel method.Surface topography of the thin films has been measured by atomic force microscopy（AFM）.AFM images of the thin films were characterized by multifractal.AFM results show that RMS roughness changes from 7.4 nm to 44.4 nm and the average grain size grows up continuously with the increase of Na concentration.Multifractal analysis indicates that as Na concentration increases,the spectrum width（Δα） of multifractal spectra changes from 0.059 to 0.200,and the Δf is always more than zero.It is obvious that the nonuniformity of the height distribution increases with the increase of Na concentration.The number of the highest peaks of the thin films is much larger than that of the lowest valleys.

关 键 词：Na掺杂ZnO薄膜 AFM 多重分形 粗糙度 

分 类 号：O484.1[理学—固体物理]