The effect of deposition temperature on the intermixing and microstructure of Fe/Ni thin film  

作　　者：陈尚达 王涛 郑德立 周益春 

机构地区：[1]Faculty of Materials,Photoelectronics and Physics,Xiangtan University [2]Key Laboratory of Low-Dimensional Materials & Application Technology,Ministry of Education

出　　处：《Chinese Physics B》2010年第12期400-404,共5页中国物理B（英文版）

基　　金：Project supported by the National Natural Science Foundation for Young Scientists of China (Grant No. 10702058);the China Postdoctoral Science Foundation (Grant No. 20090451100)

摘　　要：The physical vapour deposition of Ni atoms on α-Fe（001） surface under different deposition temperatures were simulated by molecular dynamics to study the intermixing and microstructure of the interracial region. The results indicate that Ni atoms hardly penetrate into Fe substrate while Fe atoms easily diffuse into Ni deposition layers. The thickness of the intermixing region is temperature-dependent, with high temperatures yielding larger thicknesses. The deposited layers are mainly composed of amorphous phase due to the abnormal deposition behaviour of Ni and Fe. In the deposited Ni-rich phase, the relatively stable metallic compound B2 structured FeNi is found under high deposition temperature conditions.The physical vapour deposition of Ni atoms on α-Fe（001） surface under different deposition temperatures were simulated by molecular dynamics to study the intermixing and microstructure of the interracial region. The results indicate that Ni atoms hardly penetrate into Fe substrate while Fe atoms easily diffuse into Ni deposition layers. The thickness of the intermixing region is temperature-dependent, with high temperatures yielding larger thicknesses. The deposited layers are mainly composed of amorphous phase due to the abnormal deposition behaviour of Ni and Fe. In the deposited Ni-rich phase, the relatively stable metallic compound B2 structured FeNi is found under high deposition temperature conditions.

关 键 词：molecular dynamics physical vapour deposition Ni/Fe thin film temperature effect 

分 类 号：O484.1[理学—固体物理]