CeO_2涂层薄膜的制备  

On the Preparation of CeO_2 Coating Film

作　　者：郭志超[1] 吕昭[1] 

机构地区：[1]北京工业大学材料学院国家教育部功能材料重点实验室,北京100124

出　　处：《新乡学院学报》2010年第5期36-39,共4页Journal of Xinxiang University

基　　金：国家自然科学基金(50771003和50802004)

摘　　要：采用化学溶液沉积(CSD)法,在Ni基带上制备高性能CeO2涂层。研究了前驱液性质、前驱膜的热处理问题,通过溶液干凝胶粉末的热分解过程,用XRD分析了薄膜物相,并用红外分析来验证,确定了前驱膜的烧结温度范围。用视频光学接触角量仪验证了溶液和基底具有良好的浸润性。In this paper,Chemical Solution Deposition（CSD） method was used to prepare high-performance CeO2 coat film on the Ni slice.The character of precursor solution,the coating process of films and the heat treatment process of precursor films have been researched.The sinter performance parameters are confirmed on the researched of the precursor solution dry gelatin powder decompound processes analysed and the XRD phase of the CeO2 film which were validated with IR spectra infrared analyzer.The soakage quality of the film and the metal were denoted by Video Photics Protractor,the result shows that they are well contiguity.

关 键 词：CSD法 CeO2涂层 凝胶粉末 浸润性 

分 类 号：O484.1[理学—固体物理]