晶振膜厚监控技术中Tooling Factor的精确标定  

Accurate Calibration of Tooling Factors for Quartz Crystal Coating Thickness Monitoring Technique

作　　者：张立超[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室,吉林长春130033

出　　处：《光机电信息》2010年第11期56-60,共5页OME Information

基　　金：国家自然科学基金项目(No.60678034);国家科技重大专项项目

摘　　要：晶振监控法是一种实现非规整膜系监控的重要手段。在晶振监控中,晶振片与镀膜基片上沉积薄膜厚度的比值,即Tooling Factor是相对固定的。采用晶振监控法实现薄膜厚度的精确控制必须对Tooling Factor进行精确标定。本文提出了精确标定Tooling Factor的方法,并对这种方法进行了实验验证。结果表明,该方法能够将膜厚控制误差从～20%降低到6%的水平,从而使多层膜的反射率曲线更加接近设计结果,实现多层膜膜厚的精确控制。Quartz crystal monitoring is an important method to control film thicknesses in non-quarterwave coatings.In this method,the ratio of thicknesses on the crystal slab and the coating substrate,that is,the Tooling Factor has a fixed value.Therefore,accurate calibration of Tooling Factors is critical for accurate control of coating thicknesses.In this paper,a method to accurate calibrating Tooling Factors is presented together with validating experiments.Results show that film thickness control errors can be reduced from the level of ～20% to ～6% when taking this method.Thus the measured reflectivity curve is consistent with the designed one.The accurate film thickness control can be realized.

关 键 词：膜厚控制 晶振监控 TOOLING FACTOR 

分 类 号：O484.4[理学—固体物理]