电感耦合等离子体原子发射光谱法测定氧化铁皮中11种杂质元素  

Determination of eleven impurity elements in mill scale by inductively coupled plasma atomic emission spectrometry

作　　者：刘稚[1] 丁仕兵[1] 闵国华[1] 王越[1] 

机构地区：[1]山东出入境检验检疫局,山东青岛266500

出　　处：《冶金分析》2010年第11期54-57,共4页Metallurgical Analysis

摘　　要：用王水微波消解样品,样品溶解后用氢氟酸挥硅,高氯酸蒸发,盐酸溶解盐类,然后用电感耦合等离子体原子发射光谱法测定溶液中Al,Pb,Co,Cr,Cu,Mg,Mn,Ni,Zn,P,Ca 11个元素。硅对铝的测定有影响,但在试样溶解后已通过氢氟酸挥硅将其除去;基体元素铁产生背景干扰,绘制校准曲线时通过在标准系列溶液中加入与试液同量的铁而消除。本法已用于进口氧化铁皮样品11种元素的分析,相对标准偏差小于8%,回收率在95%~106%范围。The samples were digested in aqua regia by microwave.Silicon was removed by hydrofluoric acid.After evaporation of perchloric acid,the salt was dissolved in hydrochloric acid.Then,eleven impurity elements in solution including Al,Pb,Co,Cr,Cu,Mg,Mn,Ni,Zn,P and Ca were determined by inductively coupled plasma atomic emission spectrometry.Silicon had influence on the determination of Al,but it had been removed by hydrofluoric acid.The matrix iron had background interference,so the same amounts of iron in sample solution should be added into standard solution during the plotting of calibration curve.This method has been applied to the determination of eleven elements in import mill scale with the RSD8% and the recoveries of 95 %-106 %.

关 键 词：电感耦合等离子体原子发射光谱法 微波消解 氧化铁皮 杂质元素 

分 类 号：TG115.3[金属学及工艺—物理冶金]