溅射镀膜用铌靶材晶粒尺寸控制工艺研究  

Research on Grain Size Controlling Process of Niobium Target Used for Sputtering and Coating

作　　者：李兆博 张春恒 李桂鹏 同磊 

机构地区：[1]宁夏东方钽业股份有限公司国家钽铌特种金属材料工程技术研究中心,宁夏石嘴山753000

出　　处：《材料开发与应用》2010年第6期33-35,39,共4页Development and Application of Materials

摘　　要：铌靶材主要应用于表面工程材料,如船舶、化工、液晶显示器(LCD)以及耐热、耐腐蚀等镀膜行业。作为被溅射的基材,为了获得均匀一致的薄膜淀积速率,对溅射铌靶材的主要要求是均匀的组分、合适的颗粒尺寸以及具体的结晶学取向。本文主要研究在实际生产中,锻造工艺、轧制工艺以及热处理工艺对溅射镀膜用铌靶材晶粒尺寸的影响。通过多次试验,得到合理的锻造工艺、轧制工艺以及热处理工艺,从而对铸锭晶粒进行彻底的破碎和再结晶,最终得到晶粒尺寸小于100μm,且均匀一致的等轴晶组织,满足了溅射镀膜用铌靶材要求的晶粒尺寸和均匀等轴晶组织。Niobium Target is mainly used for surface engineering materials in the area such as vessel, chemical, LCD, and heat- resisting and corrosion resisting coating film industry. As a sputtered base material, in order to get uniform and consistent films deposited rate, the main requirements for sputtering niobium target are uniform component, applicable particle size and specific crystallized orientation. This article mainly deals with the effect on grain size of niobium target used for sputtering and coating, which is generated by forging, rolling and heating treatment processes in practical production. Through trials, reasonable forging, rolling and heating treatment process are determined, in which the thorough breakage and recrystallization of ingots grain will occur and uniform and consistent isometric crystal texture is obtained with grain size less than 100μm,which satisfies the requirement of grain size and uniform isometric crystal texture for niobium target used for sputtering and coating.

关 键 词：溅射镀膜铌靶材 晶粒尺寸 等轴晶组织 

分 类 号：TG372[金属学及工艺—金属压力加工]