Study on NiO/Fe interface with X-ray photoelectron spectroscopy  

Study on NiO/Fe interface with X-ray photoelectron spectroscopy

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作  者:Chun Feng Jing-yan Zhang Jiao Teng Fu-ming Wang 

机构地区:[1]School of Materials Science and Engineering, University of Science and Technology Beijing, Beijing 100083, China [2]School of Metallurgical and Ecological Engineering, University of Science and Technology Beijing, Beijing 100083, China

出  处:《International Journal of Minerals,Metallurgy and Materials》2010年第6期777-781,共5页矿物冶金与材料学报(英文版)

基  金:supported by the National Natural Science Foundation of China (Nos.50871014, 50831002, 50971021, and 50901007);the Funding Project for Academic Human Resources Development in Institutions of Higher Learning under the Jurisdiction of Beijing Municipality (No.PHR201007122)

摘  要:Different monolayers (ML) of Fe atoms were deposited on NiO (001) substrates or NiO underlayers using molecular beam epitaxy (MBE), pulse laser deposition (PLD), and magnetron sputtering (MS). The magnetic properties and microstructure of the films were studied. The apparent magnetic dead layer (MDL) is found to exist at the NiO/Fe interfaces of the MBE sample (about 2 ML MDL), the PLD sample (about 3 ML MDL), and the MS sample (about 4 ML MDL). X-ray photoelectron spectroscopy indicates the presence of ionic Fe (Fe2+ or Fe3+) and metallic Ni at the NiO/Fe interfaces, which may be due to the chemical reactions between Fe and NiO layers. This also leads to the formation of MDL. The thickness of the MDL and the reaction products are related with the deposition energy of the atoms on the substrates. The interfacial reactions are effectively suppressed by inserting a thin Pt layer at the NiO/Fe interface.Different monolayers (ML) of Fe atoms were deposited on NiO (001) substrates or NiO underlayers using molecular beam epitaxy (MBE), pulse laser deposition (PLD), and magnetron sputtering (MS). The magnetic properties and microstructure of the films were studied. The apparent magnetic dead layer (MDL) is found to exist at the NiO/Fe interfaces of the MBE sample (about 2 ML MDL), the PLD sample (about 3 ML MDL), and the MS sample (about 4 ML MDL). X-ray photoelectron spectroscopy indicates the presence of ionic Fe (Fe2+ or Fe3+) and metallic Ni at the NiO/Fe interfaces, which may be due to the chemical reactions between Fe and NiO layers. This also leads to the formation of MDL. The thickness of the MDL and the reaction products are related with the deposition energy of the atoms on the substrates. The interfacial reactions are effectively suppressed by inserting a thin Pt layer at the NiO/Fe interface.

关 键 词:interracial reaction magnetic films X-ray photoelectron spectroscopy magnetic properties MICROSTRUCTURE 

分 类 号:O484.1[理学—固体物理] TQ530[理学—物理]

 

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