Efficiency measurement of optical components in 45-110 nm range at beamline U27,HLS  

作　　者：贺胜男 刘颖 邱克强 周洪军 霍同林 付绍军 

机构地区：[1]National Synchrotron Radiation Laboratory,University of Science and Technology of China

出　　处：《Chinese Optics Letters》2010年第12期1131-1134,共4页中国光学快报（英文版）

基　　金：supported by the National Natural Science Foundation of China under Grant No.10975139

摘　　要：We propose a general correction method for the efficiency measurement of optical components in the 45-110 nm range to eliminate the contamination of higher-order harmonics at beamline U27 of the Hefei Light Source （HLS）. The influence of harmonics can be deducted effiectively from the initial measurement results through the analysis of the proportion of harmonics with a transmission grating and the efficiency measurement of optical elements at the harmonics wavelengths. The reflectivity measurement of a gold film is performed at the beamline to verify its validity. Results indicate that the corrected reflectivity is in good agreement with the theoretical value. The maximal deviation amounts to 1.93% at a wavelength of 85 nm and an incident angle of 5°.We propose a general correction method for the efficiency measurement of optical components in the 45-110 nm range to eliminate the contamination of higher-order harmonics at beamline U27 of the Hefei Light Source （HLS）. The influence of harmonics can be deducted effiectively from the initial measurement results through the analysis of the proportion of harmonics with a transmission grating and the efficiency measurement of optical elements at the harmonics wavelengths. The reflectivity measurement of a gold film is performed at the beamline to verify its validity. Results indicate that the corrected reflectivity is in good agreement with the theoretical value. The maximal deviation amounts to 1.93% at a wavelength of 85 nm and an incident angle of 5°.

关 键 词：Light sources REFLECTION 

分 类 号：O436[机械工程—光学工程]