孔径可调的介孔SiO_2自支持薄膜的溶剂挥发诱导自组装合成与表征  

Synthesis and Characteristic of Pore Size-tailored Self-supporting Mesoporous Film via Solvent Evaporation Induced Self-assembly

作　　者：俞义轩[1] 刘建[1] 南海明[1] 刘茜[1] 蔡强[1] 李恒德[1] 

机构地区：[1]清华大学材料科学与工程系,北京100084

出　　处：《高等学校化学学报》2010年第11期2136-2140,共5页Chemical Journal of Chinese Universities

基　　金：国家"八六三"计划项目(批准号:041403311)资助

摘　　要：以十六烷基三甲基溴化铵(CTAB)为模板剂,正硅酸乙酯为硅源,在弱酸性条件下利用溶剂挥发诱导自组装(EISA)合成出具有介孔结构的二氧化硅薄膜.通过控制EISA过程中溶剂挥发的环境,可在1.4～3.1nm的范围内调节介孔结构的孔径.实验表明,较快的溶剂挥发速率有助于较大孔径的介孔结构生成.用该方法合成的介孔薄膜具有蠕虫状孔道结构和良好的孔径均一性.在外观上,该薄膜具有均匀、透明和无缺陷等特点,可以自支撑,并且具有一定的韧性.Mesoporous silica films with pore diameters of 1.7—3.1 nm were synthesized through evaporation induced self-assembly using CTAB as surfactant and TEOS as Si source in weak acid media.The films were flexible,self-supporting and centimeter-sized with wormhole-like channel systems.By controlling the solvent remove process,the pore size of films could be tailored without negative influence on the pore size uniformity.A fast volatilization speed would lead to a large pore size,while a slow volatilization speed would result in a small pore size.

关 键 词：介孔薄膜 溶剂挥发诱导自组装 孔径调节 

分 类 号：O614[理学—无机化学] O647.2[理学—化学]