氟硼酸镀液二氧化铅电沉积  

Electrodeposition of Lead Dioxide from Dluoroborate Solutions

作　　者：孔春梅[1] 唐永明[1] 杨文忠[1] 杨晓远[1] 

机构地区：[1]南京工业大学理学院,江苏南京210009

出　　处：《电化学》2010年第4期446-449,共4页Journal of Electrochemistry

基　　金：国家863计划项目(2009AA032901)资助

摘　　要：研究了在氟硼酸或其掺杂镀液中于Pt基底电沉积PbO2镀层的电化学和结构性质.循环伏安测试、XRD分析和SEM形貌观察表明,BF4-可提高二氧化铅电沉积速率;电沉积的PbO2晶型为β-PbO2;F-、Fe3+共掺杂影响晶体生长的择优取向及镀层形貌,电沉积的FB/F-Fe-PbO2镀层整齐致密;电沉积过程增大电流密度可改变生长晶面取向.The PbO2 anodes were prepared on platinum from fluoroborate media and its doped solutions by electrodeposition technique.Elecchemical and pysicochemical properties of these PbO2 films were studied by cyclic voltammetry methods,XRD and SEM.The results showed that the presence of BF4-increased PbO2 electrodeposition rate;the prepared lead dioxide consisted of β-PbO2;the preferential orientation of crystals and surface morphology were affected a lot by doping F-and Fe3＋.The FB/F-Fe-PbO2 electrode exhibited regular-shaped layers with compact morphology.Furthermore,increasing current density also change the preferential orientation of PbO2 crystals.

关 键 词：二氧化铅 电沉积 氟硼酸 掺杂离子 

分 类 号：TQ153.1[化学工程—电化学工业]