匀胶速度对钙锶铋钛陶瓷厚膜结构的影响  

Effect of rotate speed on structure of CSBT-0.4 thick films

作　　者：胡伟[1] 范素华[1] 张丰庆[1] 车全德[1] 于冉[1] 

机构地区：[1]山东建筑大学材料科学与工程学院,山东济南250101

出　　处：《山东建筑大学学报》2010年第5期472-476,共5页Journal of Shandong Jianzhu University

基　　金：国家自然科学基金项目(50872075);山东省自然科学基金项目(Y2007F36)

摘　　要：用粉末—溶胶法和快速退火工艺在S i(100)基片上制备了Ca0.4Sr0.6B i4Ti4O15陶瓷厚膜。研究了匀胶速度及退火温度对厚膜结构的影响。用X射线衍射表征了厚膜的晶体结构,用扫描电镜观察了样品显微形貌。结果表明在750℃进行退火,匀胶速度为4500 r/m时样品晶粒发育良好,表面平整无裂纹,厚度约为1.5μm,且a轴取向较明显。The Ca0.4Sr0.6Bi4Ti4O15 thick films are prepared on Si（100） substrate by powder-sol processing and rapid annealing technology.The effect of rotate speed and annealing temperature on CSBT-0.4 thick films structure are investigated.The crystal structure of thick films is characterized by XRD.The morphologies of samples are observed by SEM.The results indicate that when the film is made by the spin coating at 4500r/m and annealed at 750°C,the grain sample is well developed,which is about 1.5μm thick,a-oriented,crack-free and compact.

关 键 词：Ca0.4Sr0.6Bi4Ti4O15 粉末—溶胶法 匀胶速度 厚膜 

分 类 号：TB381[一般工业技术—材料科学与工程]