退火对AlCN非晶薄膜结构及力学性能的影响  

Annealing effect on the microstructure and mechanical properties of amorphous AlCN films

作　　者：罗庆洪[1] 陆永浩[2] 娄艳芝[1] 李春志[1] 赵振业[1] Luo, Qing-Hong[1]; Lu, Yong-Hao[2]; Lou, Yan-Zhi[1]; Li, Chun-Zhi[1]; Zhao, Zhen-Ye[1]

机构地区：[1]北京航空材料研究院,北京100095 [2]北京科技大学材料科学与工程学院,北京100083

出　　处：《北京科技大学学报》2010年第12期1574-1579,1590,共7页Journal of University of Science and Technology Beijing

摘　　要：利用磁控溅射方法在单晶硅基片上制备出不同Al含量AlCN非晶薄膜,随后分别在700℃和1000℃进行真空退火热处理.使用X射线衍射仪和高分辨透射电镜研究了沉积态和退火态薄膜的组织和微观结构,用纳米压痕仪测试硬度和弹性模量.结果表明,退火态薄膜组织和微观结构强烈依赖于薄膜的Al含量.经1000℃退火后,低Al含量AlCN薄膜没有出现结晶现象,但形成了分层;高Al含量AlCN薄膜中,退火促使AlN纳米晶的生成,使薄膜形成了非晶包裹纳米晶的复合结构,随着距表面深度的增加,形成的纳米晶密度和尺寸均有减小的趋势.随着退火温度的升高,AlCN薄膜的硬度和弹性模量均降低;而对于高Al含量AlCN薄膜,由于形成了纳米复合结构,硬度和弹性模量下降幅度减少.AlCN amorphous thin films with different Al contents were deposited on Si（100）substrates by magnetron sputtering,followed by vacuum annealing at 700 ℃ and 1 000 ℃ respectively.The microstructures of the as-deposited and annealed films were characterized by X-ray diffraction（XRD）and high-resolution transmission electron microscopy（HRTEM）,and the values of nanohardness and elastic modulus were measured by the nano-indention method.The results indicated that the organization and microstructure of the annealed AlCN films strongly depended on Al content.For the thin films with low Al content,delamination rather than crystallization occurred after annealing at 1 000 ℃,but for the thin films with high Al content,annealing accelerated the formation of AlN nanocrystallites,which were embedded into amorphous matrices.The density and size of the nanocrystallites were both found decreasing with increasing depth from the film surface.With the increasing of annealing temperature,both the values of nanohardness and elastic modulus decreased;but for the AlCN films with high Al content the decreasing trends slowed down due to the formation of nanocomposite structure.

关 键 词：非晶薄膜 显微结构 力学性能 退火 

分 类 号：TG174.4[金属学及工艺—金属表面处理] O484.4[金属学及工艺—金属学]