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机构地区:[1]复旦大学材料科学系,上海200433 [2]上海空间电源研究所,上海200233 [3]福建省光催化重点实验室--省部共建国家重点实验室培育基地,福州350002
出 处:《物理化学学报》2011年第1期135-142,共8页Acta Physico-Chimica Sinica
基 金:国家重点基础研究发展规划项目(973)(2010CB933703);上海市科学技术委员会纳米专项(1052nm01800);福建省福州大学光催化重点实验室-省部共建国家重点实验室培育基地资助项目(K-081018)~~
摘 要:通过阳极氧化的方法制备TiO2纳米管薄膜,在MoO3存在的条件下对该薄膜进行热处理得到TiO2-MoO3复合纳米管阵列薄膜.利用X射线衍射(XRD),扫描电子显微镜(SEM),X射线光电子能谱(XPS),电化学阻抗谱(EIS),Mott-Schottky及光电化学方法对得到的薄膜进行了表征.XRD结果表明,TiO2-MoO3复合纳米管薄膜中的TiO2主要为锐钛矿晶型.SEM实验证实了薄膜纳米管结构的存在,样品中的MoO3均匀地分散在TiO2纳米管表面.利用XPS方法分析了TiO2-MoO3复合纳米管薄膜元素的组成,结果表明,MoO3在TiO2表面形成TiO2-MoO3复合纳米管薄膜.研究了热处理温度以及热处理时间对样品的光电化学性能的影响,相对于单纯TiO2纳米管薄膜,适量引入MoO3提高了样品在可见光区的光电响应能力,样品的平带电位负移.在450°C热处理60min制得的TiO2-MoO3复合半导体纳米管阵列薄膜光电响应活性最高.TiO2-MoO3 composite nanotube thin films were obtained by the thermal treatment of titanium dioxide nanotube thin films in the presence of MoO3.Titanium dioxide nanotubes(TiO2 NTs) thin films were prepared by the anodic oxidation of titanium foil.The resultant thin films were characterized by X-ray diffrac-tion(XRD),scanning electron microscopy(SEM),X-ray photoelectron spectroscopy(XPS),electrochemical impedance spectroscopy(EIS),Mott-Schottky analysis,and photoelectrochemical methods.The XRD patterns showed that an anatase type TiO2 was present in the thin films.Nanotube structures for the thin films were observed by SEM.MoO3 was dispersed on the TiO2 NT top surface.Elemental analysis by XPS showed that MoO3 recombined with the TiO2 NTs to form TiO2-MoO3 composite nanotube thin films.The influence of time and temperature of thermal treatment on the photoelectrochemical response for the TiO2-MoO3 composite nanotube thin film electrodes were investigated.The photoelectrochemical response of the TiO2-MoO3 composite nanotube thin film increased under visible light illumination compared with the pristine TiO2 NTs.The highest photoelectrochemical response was observed for the TiO2-MoO3 composite nanotube thin film obtained by thermal treatment at 450 ℃for 60 min.
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