Fe/ZnO(0001)体系界面相互作用中薄膜厚度效应的光电子能谱研究  

Thickness dependence of the interfacial interaction for the Fe/ZnO (0001) system studied by photoemission

作　　者：张旺[1] 徐法强[1] 王国栋[1] 张文华[1] 李宗木[1] 王立武[1] 陈铁锌[1] 

机构地区：[1]中国科学技术大学国家同步辐射实验室,核科学与技术学院,合肥230029

出　　处：《物理学报》2011年第1期545-551,共7页Acta Physica Sinica

基　　金：国家自然科学基金(批准号:10775126,10975138)资助的课题~~

摘　　要：利用同步辐射光电子能谱(SRPES)和X射线光电子能谱(XPS)技术,系统研究了室温下Fe/ZnO界面形成过程中Fe薄膜与氧结尾的ZnO(0001)衬底之间的相互作用,结果显示初始沉积的Fe明显被表面氧氧化为Fe2+离子,在Fe覆盖度为0—3nm的范围内,分别观察到与界面电荷传输、化学反应以及薄膜磁性相关的三个有意义的临界厚度,这一结果将有助于基于Fe/ZnO界面的相关器件的设计和研发.Synchrotron radiation photoemission spectroscopy （ SRPES ） and conventional X-ray photoelectron spectroscopy （XPS） were used to study the Fe/ZnO（0001） interface formation at room temperature. The interaction extent of Fe overlayer during the ZnO substrate was carefully monitored during the increase of Fe coverage,the results showed obvious Fe2 ＋ formation at the initial stage of Fe deposition. Based on the photoemission spectra （ PES） changes observed during the deposition of Fe on ZnO up to 3 nm,three meaningful and critical thicknesses have been observed which may be related to the surface charge transport,chemical reaction,and magnetic property,respectively. The new finding may be helpful to the design of related devices based on Fe /ZnO interface.

关 键 词：Fe/ZnO 界面作用 同步辐射光电子能谱 X射线光电子能谱 

分 类 号：TN201[电子电信—物理电子学]