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机构地区:[1]中国科学院上海光学精密机械研究所,上海201800
出 处:《光学技术》1999年第5期40-42,共3页Optical Technique
摘 要:讨论了如何确定及消除光学轮廓仪的系统误差,进而测定超光滑光学表面粗糙度的方法及结果。在Zygo Maxim 3D5700 表面轮廓仪上使用2-5 ×和20 ×Mirau 物镜测量rms 在0-3nm 左右的超光滑硅片,通过对每个取样区域数据16 次相位平均,再对多个取样区域高度数据平均,消除了仪器的系统误差,使超光滑光学表面粗糙度得到精确测量。并使用其它光学轮廓仪对样品做了验证测量。作为比较,在同样条件下测量了0-8nm 左右的光滑硅片。It is discussed how to eliminate the system error of the optical profiler to measure the supersmooth optical surface. The supersmooth optical silicon flat surface is measured by 2.5 × and 20 × Mirau objective on Zygo Maxim 3D 5700 profiler. The system error is eliminated by sixteen times phase average in each sample area and the high value average of more sample area. At last, the supersmooth silicon flat surface roughness is measured accurately, its rms achieve 0 263nm(by 2.5 × Mirau objective) and 0 285nm(by 20 × Mirau objective). The component is tested by other optical profiler. The rms data are about 0 3nm. In the same way, the other one is tested by Maxim 3D 5700 and New View 200 optical profiler using 2.5 × Mirau objective. Its rms achieve 0 761nm and 0 772nm.
分 类 号:TG84[金属学及工艺—公差测量技术]
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