掩膜法研究熔融态金属膜中的互扩散  

Measurement of Diffusivity in Molten Films by Masking Films Method

作　　者：赵德乾[1] 汪卫华[1] 潘明祥[1] 李顺朴[1] 陈熙琛[1] 

机构地区：[1]中国科学院物理研究所,北京100080

出　　处：《稀有金属》1999年第5期381-383,共3页Chinese Journal of Rare Metals

基　　金：航天高技术青年科学基金

摘　　要：介绍了研究金属熔体中互扩散的掩膜方法， 报道了 Ｉｎ Ｂｉ 膜在熔融态时的非对称互扩散现象。实验结果表明掩膜方法是研究熔体扩散的有效的新手段。Abstract: The masked film was devised to investigate the diffusion in molten metals. The effects of the gravity induced convection and Marangoni convection on the diffusion can be neglected in the masked film. As example, the interdiffusion coefficients of the In and Bi melt films were obtained by this method. The experimental results indicate that the method is effective for studying the diffusion in liquid metal and alloy films.

关 键 词：掩膜法 In-Bi膜 互扩散 金属熔体 

分 类 号：TG111.3[金属学及工艺—物理冶金]