多阴极金属等离子体源的特性及应用研究  

Characteristic and application study of multi-cathodes metal plasma source

作　　者：解志文[1] 王浪平[1] 王小峰[1] 闫久春[1] 黄磊[1] 陆洋[1] 

机构地区：[1]哈尔滨工业大学现代焊接生产技术国家重点实验室,哈尔滨150001

出　　处：《核技术》2011年第1期18-21,共4页Nuclear Techniques

基　　金：国家自然科学基金(10875033)资助

摘　　要：设计了一种新型的多阴极金属等离子体源,对离子流分布均匀性、导管偏压和约束磁场电流进行了测试和优化。采用该装置制备了TiAlSiN多元复合薄膜,利用EDX、XRD、XPS和纳米探针对薄膜的组成、微结构和力学性能进行测试分析。结果表明,该装置可成功地制备复合薄膜,合成的薄膜具有n-TiAlN/a-Si3N4复合结构,具有高的硬度(≥35 GPa)。A new multiple-cathodes metal plasma source was designed. The plasma uniformity, duct bias voltage and current of the magnetic coils were studied and optimized. TiAlSiN composite coating was prepared on this equipment. The chemical composition, microstructure and mechanical properties of the coating were investigated by utilizing energy dispersive X-ray （EDX）, X-ray diffraction （XRD）, X-ray photoelectron spectroscopy （XPS） and nano- indentation measurement. The results revealed that the equipment can be used for preparing composite coating. TiAlSiN coating showed n-TiAlN/a-Si3N4 composite structure. In addition, the film showed high hardness （≥35 GPa）.

关 键 词：多阴极等离子体源 均匀性 复合薄膜 硬度 

分 类 号：O539[理学—等离子体物理] O484.5[理学—物理]