射流抛光误差分析与材料去除稳定性研究  

Research of Errors Analysis and Material Removal Stability in Fluid Jet Polishing

作　　者：施春燕[1,2] 袁家虎[1] 伍凡[1] 万勇建[1] 

机构地区：[1]中国科学院光电技术研究所,四川成都610209 [2]中国科学院研究生院,北京100049

出　　处：《光学学报》2011年第1期162-166,共5页Acta Optica Sinica

基　　金：国家自然科学基金(60808017)资助课题

摘　　要：研究了射流抛光材料去除面形不呈理想的对称形和重复抛光材料去除量的波动不稳性,分析认为射流抛光过程稳定性和误差因素会影响材料去除的不稳定性。分析了射流系统的误差影响因素,其主要由压力波动、磨粒沉降作用和流体的紊动作用等部分组成,并研究了各误差影响因素的产生机理和对材料去除的影响。通过仿真和实验分析,得到压力波动、磨粒沉降作用和流体紊动作用的波动范围,构建了基于各误差的材料去除稳定性的完整表达式,理论计算误差范围与实验误差范围吻合。Experiments is designed to research the instability of fluid jet polishing system.The results show that the material removal shape is dissymmetrical,and the material removal ratio is fluctuating with different polishing regions even on the same polishing condition.Then the influence factors of the instability is analyzed,such as pressure fluctuation,abrasive particles deposition,turbulent intensity and so on.The fluctuation of those error factors are acquired from experiments and simulation.Based on these data,the uncertainty is established for material removal ratio,showing that the theoretical uncertainty accords with the experiments′ error.Polishing precision can be improved by error factors′ compensation.

关 键 词：光学制造 射流抛光 误差分析 材料去除稳定性 

分 类 号：TH74[机械工程—光学工程] TP60[机械工程—仪器科学与技术]