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机构地区:[1]福州大学材料科学与工程学院,福建福州350108 [2]福州大学表面纳米技术研究所,福建福州350108
出 处:《电子元件与材料》2011年第2期43-46,49,共5页Electronic Components And Materials
基 金:福建省自然科学基金资助项目(No.E0710005)
摘 要:采用正交设计法优化了脉冲电泳沉积制备WO3薄膜的工艺参数,并通过分析薄膜的微观结构、透射光谱和循环伏安曲线等研究了最佳工艺条件下制备的WO3薄膜的电致变色性能。结果表明,脉冲电泳沉积制备WO3薄膜的最佳工艺参数为平均电流密度0.2×10-3A/cm2,沉积时间6min,占空比75%,脉冲周期10ms。最佳工艺条件下制备的WO3薄膜厚度约为251nm,呈非晶态;在可见光区(550~800nm),光调制幅度(?T)可达76%~80%;表现出良好的电化学活性,离子存储能力达27.8×10-3C/cm2;着色/褪色响应不对称,可逆性稍低(75.1%)。The process parameters employed for the pulsed electrophoretic deposition of WO3 films were optimized by the orthogonal design method.The electrochromic properties of the WO3 films prepared under the optimized condition were studied through characterizing the microstructure,transmission spectra and cyclic voltammogram of the films.The optimal process parameters for the pulsed electrophoretic deposition of WO3 films are:average current density=0.2×10^-3 A/cm^2,deposition time=6 min,duty cycle=75% and pulse period=10 ms.For the WO3 films prepared under the optimized condition,they are amorphous film with a thickness of about 251 nm,their transmission modulation (△T) reaches 76%~80% in the visible region (550~800 nm),and they exhibit high electrochemical activity with an ion storage capacity of 27.8×10^-3 C/cm2;However,their bleaching/coloring responses are asymmetric and reversibility is relatively low (75.1%).
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