电沉积防护性硅烷薄膜的研究现状与展望  

PROGRESS AND PROSPECTIVE IN ELECTRODEPOSITED ANTI-CORROSIVE SILANE FILMS

作　　者：胡吉明[1] 杨亚琴[1] 张鉴清[1,2] 曹楚南[1,2] 

机构地区：[1]浙江大学化学系,杭州310027 [2]中国科学院金属研究所腐蚀与防护国家重点实验室,沈阳110016

出　　处：《中国腐蚀与防护学报》2011年第1期1-9,共9页Journal of Chinese Society For Corrosion and Protection

基　　金：国家自然科学基金(50871101);浙江省自然科学基金(Z4100016);浙江省钱江人才计划项目(2010R10046)资助

摘　　要：介绍电沉积硅烷Sol-gel薄膜的原理、方法、用途与研究进展,并着重介绍电沉积硅烷薄膜在金属表面防护处理中的应用。针对防护性的特殊要求,提出电沉积硅烷薄膜研究中的难点与展望。The principles,methodologies and implications of electrochemically generated silane film materials are reviewed along with some selected recent trends in the fields of functionalized and anti-corrosive sol-gel silica/organosilica films.As a major concern,the recent trends of the electro-assisted generation of organosilica films for corrosion protection are emphasized.The difficulties and the prospective in the study of electrodeposited anti-corrosive silane films are also discussed.

关 键 词：硅烷膜 电沉积 防腐蚀 进展 

分 类 号：TG178[金属学及工艺—金属表面处理]