多弧离子镀制备的CrTiAlN涂层的结构和摩擦学性能  

TiAlCrN coatings deposited by multi-arc plasma deposition

作　　者：刘传胜[1] 闫少健[1] 田灿鑫[1] 杨兵[1] 付德君[1] 

机构地区：[1]武汉大学加速器实验室,武汉430072

出　　处：《粉末冶金材料科学与工程》2010年第6期554-559,共6页Materials Science and Engineering of Powder Metallurgy

基　　金：国家科技重大专项(2009ZX04012-032)

摘　　要：用自行设计的多靶阴极电弧离子镀系统在单晶硅和硬质合金衬底上沉积CrTiAlN硬质涂层,用X射线衍射、X射线光电子能谱和扫描电镜系统研究衬底偏压和N2气分压对CrTiAlN涂层结构、形貌和摩擦学性能的影响。结果表明CrTiAlN涂层为面心立方CrN和TiAlN的复合涂层。衬底偏压、N2气分压对涂层的表面形貌、显微硬度和抗磨损性能有较大影响,在氮气分压为5.0 Pa、衬底偏压为-200 V的优化条件下,得到表面光滑的CrTiAlN涂层,涂层硬度为29 GPa,涂层对氮化硅摩擦副的摩擦因数为0.37,沉积速率3.8μm/h。TiAlCrN nanocomposite coating was prepared by a home-made industrial scale multi-arc plasma deposition system.X-ray diffraction,X-ray photoelectron spectroscopy and scan electron microscopy were employed to investigate the TiAlCrN coatings.The effects of N2 partial pressure,bia-voltage on the structure,morphology and friction property of TiAlCrN coatings were studied.Under optimal conditions（5.0 Pa N2 partial pressure,-200 V bia-voltage）,TiAlCrN coating with smooth surface was prepared at 3.8 mm/h and exhibited a hardness of 29 GPa and an average friction coefficient of 0.37 against SiC.

关 键 词：多弧离子镀 显微硬度 表面形貌 摩擦因数 

分 类 号：TG174.44[金属学及工艺—金属表面处理]