低折射率SiO_2光学增透薄膜的结构控制  

STRUCTURAL CONTROL OF SILICA THIN FILMS WITH LOW REFRACTIVE INDEX DERIVED FROM SOL GEL PROCESS

作　　者：吴广明[1] 王珏[1] 沈军[1] 杨天河[1] 赖珍荃[1] 张会林[1] 张勤远[1] 范滨[2] 周东平[2] 张凤山[2] 

机构地区：[1]同济大学波耳固体物理研究所,上海200092 [2]中国科学院上海技术物理研究所,上海200083

出　　处：《原子能科学技术》1999年第4期332-336,共5页Atomic Energy Science and Technology

基　　金：上海市应用物理中心资助

摘　　要：以正硅酸乙酯（ Ｔ Ｅ Ｏ Ｓ）为有机硅源，采用溶胶凝胶技术，通过调节溶胶的ｐ Ｈ 和掺入有机添加剂，对 Ｓｉ Ｏ２ 溶胶生长过程进行结构裁剪，控制 Ｓｉ Ｏ２ 纳米颗粒尺度，制备出低折射率（１１５～１．１８） Ｓｉ Ｏ２ 光学增透薄膜。分别采用椭偏仪、分光光度计、扫描和透射电镜等对所制备薄膜的结构、物性进行研究。研究结果表明：改变 Ｓｉ Ｏ２ 溶胶ｐ Ｈ 可有效抑制颗粒生长，且保持原有的微结构；掺入有机偶联添加剂能使颗粒迅速增大。A new method of structural control of low refraction index silica thin films is reported. Based on TEOS system and sol gel process, together with organic dopant and silane coupling agent , the microstructure of SiO 2 particles in the sol is exactly controlled. Then silica thin films with 1.15~1.18 of refractive index are obtained by use of dip coating. The films are characterized by ellipsometer, spectrophotometer,SEM and TEM, respectively. The experimental results show that adjusting pH value of the sol can effectively control and keep the microstructure of SiO 2 sol, and the doping silane coupling agent makes particles of SiO 2 sol grow up.

关 键 词：溶胶-凝胶 增透薄膜 二氧化硅 折射率 薄膜结构 

分 类 号：O484.1[理学—固体物理]