单层SiO_2和ZrO_2薄膜激光辐照损伤的对比  

Contrast Study of Laser-induced Damage of Monolayer SiO_2 and ZrO_2 Films

作　　者：章春来[1,2] 郭袁俊[2] 吕海兵[1] 袁晓东[1] 蒋晓东[1] 祖小涛[2] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,四川绵阳621900 [2]电子科技大学物理电子学院,四川成都610054

出　　处：《压电与声光》2011年第1期115-118,122,共5页Piezoelectrics & Acoustooptics

基　　金：国家"八六三"基金资助项目(2008AA8040508);中央高校基本科研业务费专项基金资助项目(ZYGX2009X007)

摘　　要：分别采用物理气相沉积和溶胶-凝胶技术在K9基片上镀制了4块光学厚度相近的Si O2和ZrO2单层膜。分别采用椭偏仪、透射式光热透镜和原子力显微镜对两类薄膜的孔隙率、热吸收和微观表面形貌进行了表征;利用Nd∶YAG激光器测试了样品的激光损伤阈值(LIDT;1 064 nm/8.1 ns),并用光学显微镜观察了两类薄膜的损伤形貌。结果表明,化学膜的孔隙率和表面粗糙度均大于相应的物理膜;对同一类薄膜而言,Si O2化学膜的孔隙率和表面粗糙度都比ZrO2化学膜大,物理膜则相反。化学膜有更小的热吸收,其损伤阈值普遍比物理膜高出1倍,其损伤形貌多为热熔型,而物理膜多为应力型。Four pieces of the monolayer SiO2 and ZrO2 films with similar optical thickness were deposited on K9 glass substrates with the electron beam evaporation method（PVD） and dip-coating method（Sol-Gel）,respectively.The porous ratio,thermal absorption and surface morphologies were investigated by the ellipsometer,Stanford photo-thermal solutions and atomic force microscopy,respectively.The laser-induced damage threshold（LIDT） of the two kinds of films was measured by Nd∶YAG laser（1 064 nm/ 8.1 ns）.The optical microscopy was used to characterize the damage morphology after laser irradiation.The experimental results showed that the damage morphologies of the two kinds of films were relative to their thermal absorption and microstructure.The Sol-Gel films had larger porous structure and surface roughness than the PVDs,for the same film,the SiO2 film had larger porous structure and surface roughness than that of the ZrO2,while the PVDs film was opposite.Of the all,the PVDs had larger absorption and smaller porous ratio than that of the Sol-Gel films,and they had smaller LIDT.For PVDs,the damage morphology was stress rupture,while the Sol-Gel films were mostly thermo fusion.

关 键 词：SiO2/ZrO2薄膜 孔隙率 热吸收 激光损伤阈值 损伤形貌 

分 类 号：O484.5[理学—固体物理]