电压和占空比对TC4合金表面碳氮共渗层组织与性能影响  

The Effect of Voltage and Duty Cycle on the Micro-structure and Performance of Plasma Carbonitriding Layer on the Surface of TC4 Alloy

作　　者：申仕达[1] 谢发勤[1] 胡宗纯[1] 吴向清[1] 李荣 

机构地区：[1]西北工业大学航空学院,西安710072 [2]西部金属材料股份有限公司,西安710065

出　　处：《中国表面工程》2011年第1期52-55,88,共5页China Surface Engineering

基　　金：陕西省科技计划项目(2006KG03)

摘　　要：在尿素、硝酸铵和蒸馏水组成的电解液体系中,利用液相等离子体电解渗技术在TC4钛合金表面制备碳/氮共渗层,采用SEM、XRD和摩擦磨损试验分析渗层的表面形貌、相结构和磨损性能。试验结果表明:等离子碳氮共渗层主要由TiCN相、TiO相和Ti相组成,工作电压和占空比的提高可以显著增加渗层厚度及硬度,降低渗层的平均磨损率。The film was made on TC4 alloy surface by plasma carbonitriding technique in electrolyte composed of ammonium nitrate,urea and distilled water.The influence of electric voltage and duty cycle on the film＇s hardness,thickness,phase composition,micro-structure and wear resistance was studied.The result showed that the film was composed of TiCN phase,TiO phase and Ti phase;the fabricated film＇s hardness and thickness were improved and the average abrasion rate was reduced along with the increase of electric voltage and duty cycle.

关 键 词：TICN 耐磨性 碳氮共渗 

分 类 号：TG174.44[金属学及工艺—金属表面处理]