晶体硅太阳电池表面钝化技术  

Surface Passivation for Crystalline Silicon Solar Cells

作　　者：陈伟[1,2] 贾锐[1] 张希清[2] 陈晨[1] 武德起[1] 李昊峰[1] 吴大卫[1] 陈宝钦[3] 刘新宇[1] 

机构地区：[1]中国科学院微电子研究所微波器件与集成电路研究室,北京100029 [2]北京交通大学光电子技术研究所,北京100044 [3]中国科学院微电子研究所纳米加工与新器件集成技术实验室,北京100029

出　　处：《微纳电子技术》2011年第2期118-127,共10页Micronanoelectronic Technology

基　　金：国家自然科学基金资助项目(60676001;60706023);国家重点基础研究发展计划资助项目(2009CB939703);中国科学院所长基金资助项目(YZ0635)

摘　　要：介绍了晶体硅太阳电池表面钝化技术的发展历程,表面钝化膜在晶体硅太阳电池中所起的作用,以及晶体硅太阳电池中各种钝化膜和表面钝化技术。阐述了国内和国际对晶体硅太阳电池表面钝化技术的最新研究动态,重点论述了SiO2,SiNx,SiCx和Al2O3,以及这些钝化膜的叠层钝化技术的优缺点。在此基础上进一步指出SiO2/SiNx叠层钝化膜将成为今后工业化生产的研究重点,Al2O3及其叠层钝化膜将成为今后实验室的研究重点,由于表面钝化是提高晶体硅太阳电池转换效率最有效的手段之一,今后晶体硅太阳电池表面钝化技术仍将是国内和国际研究的热点问题之一。The development and importance of the surface passivation for the crystalline silicon（c-Si）solar cells,and various passivation films and surface passivation technologies are introduced.The latest research progresses of the surface passivation for the crystalline silicon solar cells both at home and abroad are described,a variety of surface passivation schemes using diffe-rent materials,such as SiO2,SiNx,SiCx and Al2O3,and the application advantages and disadvantages of the stacks are discussed emphatically.Based on the discussion above,it is pointed out that the SiO2/SiNx stack passivation films will be the key research of the industrial production,while the Al2O3 and its stacks will become a research focus for the laboratory in the future.The good surface passivation is one of the effective methods to increase the conversion efficiency of the crystalline silicon solar cells,thus the surface passivation for the crystalline silicon solar cells still is the global research hot spot on the way forward.

关 键 词：太阳电池 钝化 减反特性 转换效率 表面复合 叠层钝化膜 

分 类 号：TM914.4[电气工程—电力电子与电力传动] TN305.2[电子电信—物理电子学]