干涉法测量光学材料光学非均匀性  

Measurement method for inhomogeneity of optical material by means of interferometry

作　　者：刘旭[1] 任寰[1] 于德强[1] 杨一[1] 郑芳兰[1] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,绵阳621900

出　　处：《激光技术》2011年第2期189-192,共4页Laser Technology

基　　金：国家八六三高技术研究发展计划资助项目

摘　　要：为了实现光学材料光学非均匀性的高精度检测,采用将光学材料制成一小楔角(小于0.117°)光学元件并利用菲索干涉法检测其光学非均匀性的方法,对测量过程进行了理论仿真分析和熔石英材料光学非均匀性的实验验证,取得了熔石英材料的光学非均匀性数据,峰谷值为4.33×10^(-6),均方根值为0.862×10^(-6),测量准确度优于4.8×10^(-7)。结果表明,该测量方法能有效避免目前检测方法中将光学材料制成平板元件而引起干涉混叠的现象。In order to measure inhomogeneity of optic material accurately, an optical wedge was prepared at a small angle less than 0. 117° . Then its inhomogeneity was measured with a Fizeu interferometer. This method was proved to be correct by simulation and experiments in which the inhomogeneity of fused silica was measured, and the peak to valley value of fused silica was 4. 33 ×10-6, and the root mean square value was 0. 862×10-6, and the accuracy of this method was less than 4. 8×10-7. The results show that the light reflected either from the front surface or from the near surface can be distinguished with this method.

关 键 词：测量与计量 干涉测量 光学非均匀性 计算机仿真 高功率激光系统 

分 类 号：TN249[电子电信—物理电子学]