激光冲击波清洗K9玻璃表面SiO_2颗粒的研究  

Clearance of SiO_2 particles on K9 glass surfaces by means of laser Shockwave

作　　者：叶亚云[1] 袁晓东[1] 向霞[1] 王海军[1] 晏良宏[1] 陈猛[1] 吕海兵[1] 贺少勃[1] 

机构地区：[1]中国工程物理研究院激光聚变研究中心,绵阳621900

出　　处：《激光技术》2011年第2期245-248,共4页Laser Technology

基　　金：国家八六三高技术研究发展计划资助项目(2009AA8044005)

摘　　要：光学元件表面的颗粒污染物会影响到光学系统的正常运行,为了解决此污染问题,采用激光等离子体冲击波清洗法移除K9玻璃表面的SiO_2颗粒污染物。在激光器扫描模式下,实验研究此方法的清洗效果;在激光单点作用下,理论计算了颗粒位置、激光作用距离及激光能量对清洗效果的影响,并以实验加以验证。结果表明,通过良好地控制激光参量,采用Nd:YAG激光清洗K9玻璃表面的SiO_2颗粒具有明显的效果;在激光单点作用下,计算结果与实验结果规律一致。Particle contaminations on the optical surfaces limit the operation of optical systems. In order to solve the pollution problem, laser plasma shockwave was utilized to remove the SiO2 particles on the surface of K9 glass. The laser cleaning effect was studied in the scanning mode. In case of single pulse laser cleaning, the effect of several parameters, such as particle position, separation distance and laser energy, on the cleaning result was simulated and demonstrated in experiments. The results show that Nd： YAG laser can remove the SiO2 particles effectively if properly controlling the laser parameters. The simulation results are consistent with the experimental ones in case of single pulse laser cleaning.

关 键 词：激光技术 移除率 激光等离子体冲击波清洗 K9玻璃 SIO2颗粒 

分 类 号：TN249[电子电信—物理电子学]