催化剂对纳米非晶碳膜场发射性能的影响  

Effects of Catalyst on The Field Emission Properties of Nano-amorphous Carbon Films

作　　者：张新月[1] 曾凡光[1] 姚宁[2] 张兵临[2] 

机构地区：[1]郑州航空工业管理学院数理系,河南郑州450015 [2]郑州大学材料物理教育部重点实验室,河南郑州450052

出　　处：《发光学报》2011年第1期83-86,共4页Chinese Journal of Luminescence

基　　金：河南省基础与前沿技术研究计划(092300410139);航空基金(2009ZE55003);河南省教育厅自然科学基础研究计划(2010B140015)资助项目

摘　　要：利用微波等离子体增强化学气相沉积(MPECVD)法,在经处理的单晶硅衬底上沉积了纳米非晶碳薄膜。通过Raman、SEM、XRD表征,研究了催化剂对纳米非晶碳膜的生长速率及场发射性能的影响。结果表明,在制备纳米非晶碳膜时使用FeCl3作为催化剂可大幅提高其生长速率。在相同的制备条件下,与未加FeCl3催化剂制备的纳米非晶碳膜的场发射性能相比,加催化剂制备的碳膜开启电场降至0.5V.μm-1;在1.8V.μm-1的电场下,电流密度可以达到2.6mA.cm-2,而且发射点密度较大、分布均匀。Nano-amorphous carbon films were synthesized on Si substrates by microwave plasma enhanced chemical vapor deposition（MPECVD）.Through Raman,SEM,XRD characterization,the effects of catalyst FeCl3 on the growth rate and the field emission properties of nano-amorphous carbon films were discussed.The experimental results show that the catalyst FeCl3 can increase the growth rate of the nano-amorphous carbon films greatly.Compared with the nano-amorphous carbon films without catalyst in the same preparation conditions,the threshold field of the carbon films using catalyst is very low（about 0.5 V·μm-1）,the current density of 2.6 mA·cm-2 can be obtained at an electric field of 1.8 V·μm-1 and the emission sites density are greater,and with homogeneous distribution.

关 键 词：纳米非晶碳膜 催化剂 场发射 

分 类 号：O462.4[理学—电子物理学]