等离子弧淬火单片机控制系统的研究  

Study on MCU Control System with Plasma Arc Quenching

作　　者：于光平[1] 刘冰[1] 杨静山[1] 

机构地区：[1]沈阳工业大学,辽宁沈阳110870

出　　处：《东北电力技术》2011年第1期5-7,27,共4页Northeast Electric Power Technology

摘　　要：等离子弧淬火热源装置热效率高,成本低,有巨大的发展潜力。等离子弧淬火单片机控制系统通过双反馈环节(高速反馈控制环节和低速总体趋势控制环节)实现淬火过程中对淬火电流的稳定控制,使系统在特殊干扰下或失控时工件得到快速保护而不被烧蚀。设计的等离子弧淬火单片机控制系统的控制过程具有智能调节功能,可提高工件淬火稳定性从而提高淬火质量。系统设计中采取了一系列抗电磁干扰措施,使系统可在高频大电流的强电磁干扰下可靠工作。Heat source device with plasma arc quenching is of great capacity for its high thermal efficiency and low cost.MCU control system with plasma arc quenching.In MCU control system with plasma arc quenching,stability control of quenching current is implemented by bi-feedback procedures（high-speed feedback control and low-speed overall trend control）,so that the workpiece can quickly be protected from ablation under special interference or out of control.The designed controlling procedure of MCU control system with plasma arc quenching has intelligent adjusting function which can enhance quenching stability of the workpiece because of high quenching quality.A serious of anti-electromagnetic measures is applied to the designed system,so that the system can work reliably under power electromagnetic interference of HF large current.

关 键 词：等离子弧淬火 单片机 抗干扰 

分 类 号：TG156.3[金属学及工艺—热处理]